Boron Carbonitride Films with Tunable Composition: LPCVD and PECVD Synthesis Using Trimethylamine Borane and Nitrogen Mixture and Characterization

This study reports the chemical vapor deposition of amorphous boron carbonitride films on Si(100) and SiO2 substrates using a trimethylamine borane nitrogen mixture. BCxNy with different compositions were produced via variations in substrate temperature type gas-phase activation. The low-pressure (LPCVD) plasma-enhanced (PECVD) methods used. “elemental composition—chemical bonding state—properties” relationship synthesized was systematically studied. hydrophilicity, mechanical, optical properties are discussed detail. composition deposited by LPCVD method at temperatures ranging from 673 to 973 K close that carbide low content (BCxNy). refractive index these changed range 2.43 2.56 increased temperature. transparency achieved 85%. hydrophilic water contact angles varied between 53 63°; surface free energy 42–48 mN/m. microhardness, Young’s modulus elastic recovery ranged within 24–28 GPa, 220–247 70–74%, respectively. structure PECVD hexagonal nitride, their can be described BCxNyOz:H formula. In case process, smooth only (373–523 K). 1.51 1.67. 95%; band gap evaluated as 4.92–5.28 eV. Unlike films, they very soft, 0.8–1.4 25–26 19–28%, A set optimized process parameters fabricate improved mechanical high is suggested.